10 former Samsung employees are accused of leaking Samsung’s 10-nm DRAM technology to CXMT, allegedly allowing the latter to achieve technological breakthroughs on stolen information.
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Intel’s Fab 52 in Arizona is currently the most advanced chip production facility in America, but it has yet to reach its full 40,000-wafer capacity due to low 18A yields.
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Chinese fabs are quietly extending the useful life and performance of older ASML deep ultraviolet lithography systems by upgrading key subsystems, as Beijing pushes to sustain advanced chip output.
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IMEC has successfully demonstrated the full wafer-scale fabrication of nanopores using ASML’s state-of-the-art extreme ultraviolet (EUV) machines.
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Samsung has announced its own SOCAMM2 LPDDR5-based memory module designed specifically for AI data center platforms, pitching it as as a way to bring the power efficiency and bandwidth advantages of LPDDR5X into servers. …
Taiwan’s government is considering imposing N+2 export rule on TSMC’s advanced process technologies, which would make it significantly harder for the foundry to develop overseas.
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A new report from the Council on Foreign Relations concludes that Huawei’s AI chip capabilities lag behind Nvidia’s by a wide margin, and that the gap is growing exponentially.
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Fab 21 phase 2 shell is complete, fab is on track for equipment move in in mid-2026 and for volume production in 2027.
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Honda announced the suspension of operations in five automotive manufacturing plants, citing the lack of legacy chips from Nexperia as the reason behind the move.
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China has reportedly built and begun testing a secret EUV lithography prototype using ASML-style laser-produced plasma technology. Yet, despite generating 13.5-nm light, the system remains unable to make chips and appears …